CVD SiC Coating

Kenyelletso ea Silicon Carbide Coating 

Liaparo tsa rona tsa Chemical Vapor Deposition (CVD) Silicon Carbide (SiC) ke lera le tšoarellang haholo ebile le sa senyehe, le loketseng tikoloho e hlokang ho bola ho hoholo le ho hanyetsa mocheso.Ho roala silicon Carbidee sebelisoa ka likarolo tse tšesaane ho li-substrates tse fapaneng ka ts'ebetso ea CVD, e fanang ka litšobotsi tse phahameng tsa ts'ebetso.


Likarolo tsa Bohlokoa

       ● -Bohloeki bo ikhethang: Ho ithorisa ka sebopeho se hloekileng haholo sa99.99995%, ronaHo roala ha SiCe fokotsa likotsi tsa tšoaetso ts'ebetsong e hlokolosi ea semiconductor.

● -Bohanyetsi bo Phahameng: E bonts'a khanyetso e ntle ka ho fetesisa le ho bola, e etsa hore e be e loketseng bakeng sa litlhophiso tse thata tsa lik'hemik'hale le plasma.
● -High Thermal Conductivity: E netefatsa ts'ebetso e tšepahalang tlas'a mocheso o feteletseng ka lebaka la thepa ea eona e ikhethang ea mocheso.
● -Botsitso ba Dimensional: E boloka botšepehi ba sebopeho ho pholletsa le mefuta e mengata ea mocheso, ka lebaka la coefficient ea eona e tlaase ea katoloso ea mocheso.
● -Bothata bo Matlafalitsoeng: Ka boima bo boholo ba40 GPA, seaparo sa rona sa SiC se mamella tšusumetso e kholo le ho senya.
● -Smooth Surface Qetella: E fana ka sephetho se kang seipone, se fokotsa tlhahiso ea likaroloana le ho ntlafatsa ts'ebetso ea ts'ebetso.


Lisebelisoa

Semicera Liaparo tsa SiCli sebelisoa ka mekhahlelo e fapaneng ea tlhahiso ea semiconductor, ho kenyelletsa:

● -Tlhahiso ea Chip ea LED
● -Tlhahiso ea Polysilicon
● -Khōlo ea Crystal ea Semiconductor
● -Silicon le SiC Epitaxy
● -Thermal Oxidation and Diffusion (TO&D)

 

Re fana ka lisebelisoa tse koahetsoeng ka SiC tse entsoeng ka matla a phahameng a isostatic graphite, carbon fiber-reinforced carbon le 4N recrystallized silicon carbide, e etselitsoeng li-reactors-bed reactors,Li-converter tsa STC-TCS, CZ unit reflectors, sekepe sa SiC wafer, SiCwafer paddle, SiC wafer tube, le li-wafer carriers tse sebelisoang ho PECVD, silicon epitaxy, MOCVD process..


Melemo

● -Bophelo bo Atolositsoeng: E fokotsa haholo nako ea ho fokotsa nako ea lisebelisoa le litšenyehelo tsa tlhokomelo, ho matlafatsa katleho ea tlhahiso ka kakaretso.
● -Boleng bo Ntlafetseng: E fihlella libaka tse hloekileng tse hlokahalang bakeng sa ts'ebetso ea semiconductor, ka hona e matlafatsa boleng ba sehlahisoa.
● -Keketseho ea Bokhoni: E ntlafatsa mekhoa ea mocheso le ea CVD, e bakang linako tse khutšoanyane tsa potoloho le lihlahisoa tse phahameng.


Litlhaloso tsa Tekheniki
     

● -Sebopeho: FCC β phase polycrystaline, haholo-holo (111) e sekametseng
● -Tekano3.21 g/cm³
● -Bothata: boima ba 2500 Vickes (moroalo oa 500g)
● -Ho thatafala ha Letsoho: 3.0 MPa·m1/2
● -Katoloso ea Thermal Coefficient (100–600 °C): 4.3 x 10-6k-1
● -Elastic Modulus(1300 ℃):435 GPA
● -Tlhaloso ea Botenya ba Filimi:100µm
● -Bokhopo ba Bokaholimo:2-10 µm


Purity Data (E lekantsoe ka Glow Discharge Mass Spectroscopy)

Element

ppm

Element

ppm

Li

<0.001

Cu

<0.01

Be

<0.001

Zn

<0.05

Al

<0.04

Ga

<0.01

P

<0.01

Ge

<0.05

S

<0.04

As

<0.005

K

<0.05

In

<0.01

Ca

<0.05

Sn

<0.01

Ti

<0.005

Sb

<0.01

V

<0.001

W

<0.05

Cr

<0.05

Te

<0.01

Mn

<0.005

Pb

<0.01

Fe

<0.05

Bi

<0.05

Ni

<0.01

 

 
Ka ho sebelisa theknoloji ea morao-rao ea CVD, re fana ka mokhoa o hlophisitsoengLitharollo tsa ho roala SiCho fihlela litlhoko tse matla tsa bareki ba rona le nts'etsopele ea ts'ehetso ea tlhahiso ea li-semiconductor.