Likarolo tse tiileng tsa CVD SILICON CARBIDE li amoheloa e le khetho ea mantlha bakeng sa mehele ea RTP/EPI le metheo le likarolo tsa plasma aetch cavity tse sebetsang ka mocheso o phahameng o hlokahalang oa ho sebetsa (> 1500 ℃), litlhoko tsa bohloeki li phahame haholo (> 99.9995%) le tshebetso e ntle haholo ha khanyetso ea lik'hemik'hale e phahame haholo. Lisebelisoa tsena ha li na mekhahlelo ea bobeli moeling oa lijo-thollo, kahoo likarolo tsa tsona li hlahisa likaroloana tse fokolang ho feta lisebelisoa tse ling. Ho phaella moo, likarolo tsena li ka hloekisoa ka ho sebelisa HF / HCl e chesang ka ho senyeha ho fokolang, ho fella ka likaroloana tse fokolang le bophelo bo bolelele ba tšebeletso.
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