SiC-Coated Epitaxial Reactor Barrel

Tlhaloso e Khutšoanyane:

Semicera e fana ka mefuta e fapaneng ea li-susceptors le likarolo tsa graphite tse etselitsoeng li-epitaxy reactor tse fapaneng.

Ka tšebelisano-'moho le li-OEM tse etelletseng pele indastering, boiphihlelo bo pharalletseng ba thepa, le bokhoni bo tsoetseng pele ba tlhahiso, Semicera e fana ka meralo e hlophisitsoeng ho fihlela litlhoko tse ikhethileng tsa kopo ea hau. Boitlamo ba rona ba bokhabane bo netefatsa hore o fumana litharollo tse nepahetseng bakeng sa litlhoko tsa hau tsa epitaxy reactor.

Re romelle lengolo-tsoibila

Lintlha tsa Sehlahisoa

Li-tag tsa Sehlahisoa

Tlhaloso

Khampani ea rona e fana kaHo roala ha SiCts'ebetso ea litšebeletso holim'a graphite, ceramics le lisebelisoa tse ling ka mokhoa oa CVD, e le hore likhase tse khethehileng tse nang le carbon le silicon li ka itšoara ka mocheso o phahameng ho fumana limolek'hule tsa Sic tse hloekileng, tse ka behoang holim'a lisebelisoa tse koahetsoeng ho etsaLera le sireletsang la SiCbakeng sa mofuta oa epitaxy barrel hy pnotic.

joalo (1)

joalo (2)

Likarolo tse ka Sehloohong

1. Ho hanyetsa mocheso o phahameng oa oxidation:
khanyetso ea oxidation e ntse e le ntle haholo ha mocheso o le holimo ho 1600 C.
2. Bohloeki bo phahameng : bo entsoeng ka ho kenngoa ha mouoane oa lik'hemik'hale tlas'a boemo bo phahameng ba mocheso oa chlorination.
3. Ho hanyetsa khoholeho ea mobu: boima bo phahameng, bokaholimo bo kopanetsoeng, likaroloana tse ntle.
4. Ho hanyetsa kutu: acid, alkali, letsoai le li-reagents tse phelang.

Lintlha tse ka sehloohong tsa CVD-SIC Coating

SiC-CVD Properties
Sebopeho sa Crystal	FCC mohato oa β
Botenya	g/cm³	3.21
Ho thatafala	Vickers thata	2500
Boholo ba lijo-thollo	μm	2~10
Bohloeki ba Lik'hemik'hale	%	99.99995
Matla a Mocheso	J·kg-1 ·K-1	640
Sublimation Mocheso	℃	2700
Felexural Matla	MPa (RT 4-point)	415
Modulus e monyane	Gpa (4pt bend, 1300 ℃)	430
Katoloso ea Thermal (CTE)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300