Kenyelletso ea CVD TaC Coating:
CVD TaC Coating ke theknoloji e sebelisang mouoane oa lik'hemik'hale ho boloka tantalum carbide (TaC) e koahela holim'a substrate. Tantalum carbide ke thepa ea ceramic e sebetsang hantle e nang le thepa e ntle haholo ea mochini le lik'hemik'hale. Ts'ebetso ea CVD e hlahisa filimi e ts'oanang ea TaC holim'a substrate ka karabelo ea khase.
Lintlha tse ka sehloohong:
Excellent hardness le ho apara ho hanyetsa: Tantalum carbide e na le boima bo phahameng haholo, 'me Coating ea TaC ea CVD e ka ntlafatsa haholo ho hanyetsa ha substrate. Sena se etsa hore seaparo se be se loketseng bakeng sa lits'ebetso tse maemong a holimo, joalo ka lisebelisoa tsa ho itšeha le hlobo.
Botsitso bo Phahameng ba Mocheso: Liaparo tsa TaC li sireletsa sebōpi sa bohlokoa le likarolo tsa reactor mocheso ho fihlela ho 2200 ° C, ho bontša botsitso bo botle. E boloka botsitso ba lik'hemik'hale le mechine tlas'a maemo a feteletseng a mocheso, ho etsa hore e tšoanelehe bakeng sa ts'ebetso e phahameng ea mocheso le lisebelisoa libakeng tse phahameng tsa mocheso.
E babatsehang botsitso ba lik'hemik'hale: Tantalum carbide e na le khanyetso e matla ea kutu ho li-acids le li-alkali tse ngata, 'me CVD TaC Coating e ka thibela ka katleho tšenyo ea substrate libakeng tse senyang.
Boemo bo phahameng ba ho qhibiliha: Tantalum carbide e na le ntlha e phahameng ea ho qhibiliha (hoo e ka bang 3880 ° C), e lumellang CVD TaC Coating hore e sebelisoe maemong a phahameng a mocheso o feteletseng ntle le ho qhibiliha kapa ho senya.
E babatsehang mogote conductivity: Ho roala ha TaC ho na le conductivity e phahameng ea mocheso, e thusang ho senya mocheso ka katleho ka mekhoa e phahameng ea mocheso le ho thibela ho chesa ha libaka.
Lisebelisoa tse ka bang teng:
• Gallium Nitride (GaN) le Silicon Carbide epitaxial CVD reactor likarolo tse kenyeletsang li-wafer carrier, lijana tsa sathelaete, lishaoara, siling, le li-susceptors.
• Silicon carbide, gallium nitride le aluminium nitride (AlN) ea khōlo ea kristale e kenyeletsang li-crucibles, li-peed holders, lirings tse tataisang le li-filters.
• Likarolo tsa indasteri tse kenyelletsang lisebelisoa tsa ho futhumatsa tse hanyetsanang, li-nozzles tsa ente, mehele ea masking le li-jigs tsa brazing
Likarolo tsa ts'ebeliso:
• Mocheso o tsitsitseng ka holimo ho 2000 ° C, o lumella ho sebetsa ha mocheso o feteletseng
•E hanana le hydrogen (Hz), ammonia (NH3), monosilane (SiH4) le silicon (Si), e fana ka tšireletso libakeng tse thata tsa lik'hemik'hale.
• Thermal shock resistance e etsa hore ho be le lipotoloho tse sebetsang ka potlako
• Graphite e na le ho khomarela ka matla, ho netefatsa bophelo bo bolelele ba tšebeletso 'me ha ho na delamination ea ho roala.
• Bohloeki bo phahameng haholo ho felisa litšila tse sa hlokahaleng kapa litšila
• Ho koaheloa ka mokhoa o hlophisitsoeng ho mamella maemo a thata
Litlhaloso tsa tekheniki:
Ho lokisoa ha liaparo tse teteaneng tsa tantalum carbide ka CVD:
TAC e koahetsoeng ka kristale e phahameng le ho tšoana ho babatsehang:
CVD TAC COATING Technical Parameters_Semicera:
Thepa ea 'mele ea ho roala ha TaC | |
Botenya | 14.3 (g/cm³) |
Bongata ba Concentration | 8x1015/cm |
Essivity e khethehileng | 0.3 |
Coefficient ea ho eketsa mocheso | 6.3 10-6/K |
Ho thatafala(HK) | 2000 HK |
Bongata ba Resistivity | 4.5 ohm-cm |
Khanyetso | 1x10-5Ohm*cm |
Ho tsitsa ha mocheso | <2500℃ |
Motsamao | 237 cm2/Vs |
Boholo ba graphite bo fetoha | -10 ~ 20um |
Botenya ba ho roala | ≥20um boleng bo tloaelehileng (35um+10um) |
Tse ka holimo ke litekanyetso tse tloaelehileng.